Formation of ordered and disordered interfacial films in immiscible metal alloys

نویسندگان

  • Zhiliang Pan
  • Timothy J. Rupert
چکیده

Article history: Received 9 August 2016 Received in revised form 8 November 2016 Accepted 20 November 2016 Available online xxxx Atomistic simulations are used to study segregation-induced intergranular film formation in Cu\\Zr and Cu\\Nb alloys. While Cu\\Zr forms structurally disordered or amorphous films, ordered films comprised of a second phase usually precipitate in Cu\\Nb, with a critical nucleation size of ~1 nm belowwhich the ordered phase cannot form. While the ordered film is retained at high temperature for a low energy Ʃ11 (113) boundary, a disordering transition is observed for a high energy Σ5 (310) boundary at low dopant concentrations. Finally, the effect of free surfaces on dopant segregation and intergranular film formation is investigated for both alloys. © 2016 Published by Elsevier Ltd on behalf of Acta Materialia Inc.

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تاریخ انتشار 2016